VICTORY Process

90-Day Development Roadmap, September 2011

• Stress dependent oxidation reaction for physical oxidation simulation
• Dislocation loop model for diffusion
• Improved numerical accuracy of geometrical and physical etching and deposition
• Performance improvements of stress-dependent physical oxidation
• Further performance improvements of dopant diffusion calculations
• 2-particle model for ion enhanced chemical etching (IECE)
• 4-particle model for ionized plasma physical vapor deposition (IPVD)
• Further improvement of the interface to VICTORY Device