Optolith

Advance 2D Optical Lithography Simulator

Optolith is a powerful non-planar 2D lithography simulator that models all aspects of modern deep sub-micron lithography: imaging, exposure, photoresist bake, development, and reflow. Optolith provides a fast and accurate alternative to experimental evaluation of mask printability and process control. Optolith simulates both projection imaging and proximity printing with large mask-to-resist gap.

Rev. 112807_07