ATHENA

Process Simulation Framework

ATHENA framework integrates several process simulation modules within a user-friendly environment provided by Silvaco TCAD interactive tools. ATHENA has evolved from a world-renowned Stanford University simulator SUPREM-IV, with many new capabilities developed in collaboration with dozens of academic and industrial partners. ATHENA provides a convenient platform for simulating processes used in semiconductor industry: ion implantation, diffusion, oxidation, physical etching and deposition, lithography, stress formation and silicidation.

Key Features:

• Fast and accurate simulation of all critical fabrication steps used in CMOS, bipolar, SiGe/SiGeC, SiC, SOI, III-V, optoelectronic, MEMS, and power device technologies
• Accurately predicts multi-layer topology, dopant distributions, and stresses in various device structures
• Advanced simulation environment allows:
  • easy creation and modification of process flow input decks including automatic control of layout mask sequences
  • automatic and user-defined mesh generation and control
  • interactive plotting of 2D structures and distributions as well as 1D cross-sections
  • run-time extraction of important process and device parameters
  • optimization of process flow and calibration of model parameters
• Focused TCAD support team of Ph.D. physicists continuously developing models for new semiconductor technology advances
• Replaces costly wafer experiments with simulations to enable shorter technology development cycles and higher yields
  

Rev. 112807_20