More About
ATHENA:

Brochure (PDF) 3.4 MB

Release Notes

Manual

Training Material
Contributed by STMi Catania

Product Roadmaps
90 Day | 1 Year | 3 Year

Competitors

Examples

Software Download

Presentations

Advances in ion implantation modeling for doping of semiconductors

3.1 MB

Backend Process Simulation including Plasma Etch

1.4 MB

CMOS Latchup Simulation

1.1 MB

Elite 2D Topography

Advanced 2D deposition and etch simulator
2.2 MB

Fast Monte-Carlo Simulation of Ion Implantation

Binary collision approximation implementation within ATHENA
1.4 MB

LOCOS modeling

Modeling of Local Oxidation Processes
1.4 MB

MC Depo/Etch

2D Monte Carlo deposition and etch simulator
1.1 MB

MC Implant 1D/2D Monte Carlo Implantation Simulator

Seamlessly integrated into ATHENA's SSuprem4
2.2 MB

Modeling of implantation using analytical models

1.8 MB

Optimization of photolithography process using simulation

1.4 MB

Optolith 2D Lithography Simulator

Advanced 2D optical lithography simulator
2.8 MB

PLS Advanced Diffusion Model

New advanced diffusion model for dopants in Silicon
1.5 MB

Process Model Simulates Lithography, Plasma Etch

Sophisticated treatments for a surprising range of semiconductor processes
HTML

Process simulation calibration

1.1 MB

RTA simulation using <311> cluster models

1.4 MB

SSuprem4 Process Simulation Software

Advanced 2D Process Simulator
1.3 MB

ATHENA

Process Simulation Framework

ATHENA framework integrates several process simulation modules within a user-friendly environment provided by Silvaco TCAD interactive tools. ATHENA has evolved from a world-renowned Stanford University simulator SUPREM-IV, with many new capabilities developed in collaboration with dozens of academic and industrial partners. ATHENA provides a convenient platform for simulating processes used in semiconductor industry: ion implantation, diffusion, oxidation, physical etching and deposition, lithography, stress formation and silicidation.

Key Features:

• Fast and accurate simulation of all critical fabrication steps used in CMOS, bipolar, SiGe/SiGeC, SiC, SOI, III-V, optoelectronic, MEMS, and power device technologies
• Accurately predicts multi-layer topology, dopant distributions, and stresses in various device structures
• Advanced simulation environment allows:
  • easy creation and modification of process flow input decks including automatic control of layout mask sequences
  • automatic and user-defined mesh generation and control
  • interactive plotting of 2D structures and distributions as well as 1D cross-sections
  • run-time extraction of important process and device parameters
  • optimization of process flow and calibration of model parameters
• Focused TCAD support team of Ph.D. physicists continuously developing models for new semiconductor technology advances
• Replaces costly wafer experiments with simulations to enable shorter technology development cycles and higher yields
  
• Silvaco's strong encryption is available to protect valuable customer and third party intellectual property.

SSuprem4 - 2D Core Process Simulator SSuprem4 is a 2D process simulator that is widely used in the semiconductor industry for design, analysis and optimization of various fabrication technologies. SSuprem4 accurately simulates all major process steps in modern technology by using a wide range of physical models for diffusion, ion implantation, oxidation, etching, deposition, silicidation, epitaxy and stress formation. More...	MC Implant - Advanced Monte-Carlo Implantation Simulator MC Implant is a generic ion implantation simulator, which models ion stopping, defect generation, and ion implantation distributions in amorphous and crystalline materials. Extensive comparisons with measured profiles have shown that MC Implant is highly accurate and predictive. The simulator can be used for majority of ion/material combinations, arbitrary geometries, different substrate orientations, implant doses, energies and angles. More...
Elite - Advanced Physical Etching and Deposition Simulator Elite is an advanced 2D topography simulator for modeling physical etching, deposition, reflow and CMP planarization processes for modern semiconductor technologies. Within the ATHENA framework, Elite provides seamless bi-directional integration with SSuprem4 and Optolith process simulators and contains an additional MC Deposit/Etch module, which provides several Monte Carlo based atomistic etching and deposition models. More...	MC Deposit/Etch - 2D Monte Carlo Deposition and Etch Simulator MC Deposit/Etch is an advanced topology simulation module seamlessly interfaced with Elite, through the ATHENA framework. The module includes several Monte Carlo based models for the simulation of etch and deposit processes which use fluxes of atomic particles. More...
Optolith - Advance 2D Optical Lithography Simulator Optolith is a powerful non-planar 2D lithography simulator that models all aspects of modern deep sub-micron lithography: imaging, exposure, photoresist bake, development and reflow. Optolith provides a fast and accurate alternative to experimental evaluation of mask printability and process control. Optolith simulates both projection imaging and proximity printing with a large mask-to-resist gap. More...

Typical 90nm CMOS Process Flow

ATHENA Framework Architecture

Rev. 101410_21